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March 11, 2006  •  RAPT produces 1/140th wave SiC mirror

October 19, 2005  •  RAPT wins Phase II SBIR contract from NASA

August 1, 2004  •  RAPT opens optical manufacturing facility in Freeport, PA

May 5, 2003  •  RAPT wins 2003 Advanced Technology Program (ATP) award

October 1, 2001  •  RAPT opens operations in Livermore, CA

Newsletters

March 11, 2006  •  Welcome to the 1st quarterly newsletter from RAPT

 
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  • Reactive Atom Plasma

    Reactive Atom Plasma is an atmospheric pressure, downstream plasma patented by RAPT Industries, Inc. The plasma source delivers a stream of chemical radicals to a substrate that is placed downstream. This source of chemical radicals may be used to:

    • Shape (Etch) a surface
    • Deposit materials onto a surface
    • Chemically alter (dope) a surface
  • Applications

    • Optics Manufacturing
    • Flat Panel Displays
    • Semiconductors
    • Photovoltaics
 

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