RAPT Industries has pioneered the development and implementation of highly precise plasma-based tools for precision surface engineering.  We use our proprietary Reactive Atom Plasma (RAP™) process for precision damage-free shaping of optical and semiconductor materials, selective material removal, and material deposition.  We are applying our patented technology in select areas of optics and semiconductor device manufacturing, where rapid damage-free material removal or chemical modification of surfaces improves yields and performance.

SILICON CARBIDE OPTICS

RAPT Industries produces advanced silicon carbide optics for defense, aerospace and semiconductor applications.  Capabilities include:

• Flat optics up to 30 inches
• Flatness of 1/100 wave RMS up to 6”
• Flatness better than 1/10 wave PV up to 12”
• Flatness better than 1/6 wave PV up to 18”

Spherical and aspherical capability up to 500mm

Surface roughness of <3 angstroms achieved on most commercial CVD-coated materials

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